|
View
| Room-temperature Hall (MEMS room) | Characterization | LakeShore | HMS 7700A |
|
View
| 3D Printer | Other processes | Prusa | I3 MK3S |
|
View
| 3-zone furnace | Thermal processes | Thermo scientific | Lindberg Blue M |
|
View
| 4-point probe | Characterization | Jandel | KM3-AR |
|
View
| Acid Wet bench | Wet process benches | - | - |
|
View
| Allied Multriprep | Sample preparation | Allied | Multiprep |
|
View
| Anechoic chamber | Other processes | Unknown | 2011 |
|
View
| Angstrom - E-beam and thermal PVD | Thin film deposition | Ångstrom Engineering | EvoVac |
|
View
| Atomic layer deposition (ALD) | Plasma deposition | Beneq | TFS 200- 148 |
|
View
| Big blue tube furnace | Thermal processes | Gero | 75242 |
|
View
| Birkeland Tube furnace | Thermal processes | GSL1100X | GSL1100X |
|
View
| Cross Section Polisher | Other processes | Jeol | IB-19520CCP |
|
View
| DLTS setup “Asterix“ | Characterization | UiO | NA |
|
View
| DLTS setup “Idefix“ | Characterization | UiO | NA |
|
View
| DLTS setup “Obelix“ | Characterization | UiO | NA |
|
View
| DLTS setup “Tiffy“ | Characterization | UiO | NA |
|
View
| Ellipsometer | Characterization | Woolam | AlphaSE |
|
View
| Farraday Cage | Other processes | Unknown | 2010 |
|
View
| FEI Titan 60-300 | Surface analysis & TEM | FEI Company | Titan G2 60-300 |
|
View
| Fischione Model 1020 | Sample preparation | Fischione | Model 1020 |
|
View
| Flextura - Angular-resolved UV photoemission spectroscopy (UPS) / (ARPES) | Surface analysis & TEM | Specs | Flextura |
|
View
| Flextura - Annealing chamber | Thermal processes | Polyteknik | Flextura |
|
View
| Flextura - Low energy electron diffraction (LEED) | Surface analysis & TEM | Specs | Flextura |
|
View
| Flextura - Magnetron sputtering chamber | Thin film deposition | Polyteknik | Flextura |
|
View
| Flextura - Remote plasma chamber | Thin film deposition | Polyteknik | Flextura |
|
View
| Flextura - X-ray photoemission spectroscopy (XPS) | Surface analysis & TEM | Specs | XR-50 Twin anode |
|
View
| Forming gas | Sample preparation | AGA | H2/N2 |
|
View
| FT-IR | Characterization | Bruker | IFS 125HR |
|
View
| Gatan PIPS II | Sample preparation | Gatan | PIPS II |
|
View
| High resolution powder diffraction | Characterization | Bruker | D8-A25 |
|
View
| Image Plate Diffractometer | Characterization | Huber | G670 |
|
View
| Ion implanter | Other processes | NEC | Tandem Accelerator |
|
View
| IT-300 SEM | Characterization | JEOL | IT-300 |
|
View
| JEOL 2100F | Surface analysis & TEM | JEOL | 2100F |
|
View
| Laser cutter - ELAS | Other processes | ELAS | MASTER Mini PSG-532 |
|
View
| Laser Cutter - Roffin | Other processes | Roffin | PL E 25 SHG CL Flex |
|
View
| Lindberg Tube furnace | Thermal processes | Lindberg | 59544 |
|
View
| Lithography Wet bench | Wet process benches | - | - |
|
View
| Low resolution transmission XRD | Characterization | Bruker | D5000 |
|
View
| Low-temperature Hall (Cleanroom) | Characterization | LakeShore | EM4 HGA |
|
View
| Mask aligner 2 | Lithography | Karl Suss | MJB55 |
|
View
| Moorfield - DC/RF Magnetron sputter | Thin film deposition | Moorefield | MiniLab |
|
View
| MOVPE / MOCVD | Epitaxy | EMF | Titan Reactor |
|
View
| Multi Purpose Powder X-ray Diffraction | Characterization | Bruker AXS | D8-A25 |
|
View
| NanoPVD - DC/RF Magnetron sputter | Thin film deposition | Moorfield | NanoPVD Model S10A |
|
View
| Network analyzer ZVA67 | Network Analyzer | Rohde & Schwarz | 2013 |
|
View
| Optical Microscope | Other processes | Olympus | BX 41 M |
|
View
| PCB-milling machine | Other processes | LPKF | 2012 |
|
View
| PECVD | Plasma deposition | Advanced Vacuum | Vision 310 MK II |
|
View
| Probe station | Characterization | Wentworth Laboratories | Pegasus S200FA |
|
View
| Probestation with laser cutter | Other processes | Signatone | 2012 |
|
View
| Protochips Atmosphere Holder | Characterization | Protochips | Atmosphere |
|
View
| Protochips Fusion Holder | Characterization | Protochips | Fusion |
|
View
| QSSPC | Characterization | Sinton Instruments | WCT-120 + Suns-Voc |
|
View
| Rapid Thermal Processing - Micro | Thermal processes | AnnealSys | AS-Micro |
|
View
| Rapid Thermal Processing - One | Thermal processes | AnnealSys | AS-One |
|
View
| RBS | Characterization | Custom made | - |
|
View
| RCA Wet bench | Wet process benches | - | - |
|
View
| Reactive Ion Etch | Dry etching | Advanced Vacuum | Vision 320 MK II |
|
View
| Resist spinner | Lithography | - | CEE 100 |
|
View
| Room-temperature Hall (Cleanroom) | Characterization | Lake Shore | EM4 HGA |
|
View
| Routine Powder Diffraction | Characterization | Bruker AXS | D8 Discover |
|
View
| Scanning Probe Microscope | Surface analysis & TEM | Nanonics | MV2000 |
|
View
| Semicore - DC/RF Magnetron sputter | Thin film deposition | Semicore | TriAxis |
|
View
| Single crystal X-ray diffraction (dual source) | Characterization | Bruker | D8-Venture |
|
View
| Small Angle Scattering | Characterization | Bruker | Nanostar |
|
View
| Small blue tube furnace | Thermal processes | Gero | - |
|
View
| Solar simulator | Characterization | Newport | 91160 Full Spectrum Solar Simulator |
|
View
| Solvent Wet bench | Wet process benches | - | - |
|
View
| Spectrophotometer | Characterization | Shimadzu | SolidSpe-3700 DUV |
|
View
| Steady-state photo capacitance | Characterization | Custom made | NA |
|
View
| Stylus profiler - Clean room | Characterization | Bruker | DektakXT-A |
|
View
| Stylus profilometer - SIMS room | Characterization | Veeco | Dektak 8 |
|
View
| Tabletop Maskless Litography/Aligner System | Lithography | Heidelberg instruments | uPG501 |
|
View
| Temperature Dependent Scanning Probe Microscope | Surface analysis & TEM | Nanonics | MV2000 |
|
View
| Thermal evaporator | Thin film deposition | Balzers | BAE 250 |
|
View
| Thin Film XRD | Characterization | Panalytical | Empyrean |
|
View
| Tornado E-beam evaporation | Thin film deposition | Polyteknik | Tornado 406E |
|
View
| Transmission powder XRD | Characterization | Bruker | D5000 |
|
View
| Tube 1 - 4-stack furnace | Thermal processes | ThermCo | ThermCo |
|
View
| Tube 2 - 4-stack furnace | Thermal processes | ThermCo | ThermCo |
|
View
| Tube 3 - 4-stack furnace | Thermal processes | ThermCo | ThermCo |
|
View
| Tube 4 - 4-stack furnace | Thermal processes | ThermCo | ThermCo |
|
View
| Variable-temperature Hall (MEMS room) | Characterization | LakeShore | HMS 7700A |
|
View
| Warm cabinet | Thermal processes | - | - |
|
View
| WaveMaster 830Zi Oscilloscope | Other processes | LeCroy | 2010 |
|
View
| Wirebonder | Device mounting | Signatone | 2011 |
|
View
| XRD | Characterization | Bruker | AXS D8 Discover |