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| 3D Printer | Other processes | Prusa | I3 MK3S |
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| 3-zone furnace | Thermal processes | Thermo scientific | Lindberg Blue M |
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| 4-point probe | Characterization | Jandel | KM3-AR |
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| Allied Multriprep | Sample preparation | Allied | Multiprep |
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| Angular-resolved UV photoemission spectroscopy (UPS) / (ARPES) - Flextura | Characterization | Specs | Flextura |
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| Annealing chamber - Flextura | Thermal processes | Polyteknik | Flextura |
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| Atomic layer deposition (ALD) | Thin film deposition | Beneq | TFS 200- 148 |
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| Cathodoluminescence | Characterization | Delmic | SPARC |
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| Cross Section Polisher | Sample preparation | Jeol | IB-19520CCP |
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| DLTS setup “Asterix“ | Characterization | UiO | NA |
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| DLTS setup “Idefix“ | Characterization | UiO | NA |
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| DLTS setup “Obelix“ | Characterization | UiO | NA |
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| DLTS setup “Tiffy“ | Characterization | UiO | NA |
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| E-beam and thermal PVD - Angstrom | Thin film deposition | Ångstrom Engineering | EvoVac |
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View
| E-beam PVD - Tornado | Thin film deposition | Polyteknik | Tornado 406E |
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| Ellipsometer | Characterization | Woolam | AlphaSE |
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| FEI Titan 60-300 | Surface analysis & TEM | FEI Company | Titan G2 60-300 |
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| Fischione Model 1020 | Sample preparation | Fischione | Model 1020 |
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| Forming gas | Sample preparation | AGA | H2/N2 |
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| FT-IR | Characterization | Bruker | IFS 125HR |
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| Gatan PIPS II | Sample preparation | Gatan | PIPS II |
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| Hall effect - Low-temperature (Cleanroom) | Characterization | LakeShore | EM4 HGA |
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| Hall effect - Room-temperature (Cleanroom) | Characterization | Lake Shore | EM4 HGA |
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| Hall effect - Room-temperature (MEMS room) | Characterization | LakeShore | HMS 7700A |
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| Hall effect - Variable-temperature (MEMS room) | Characterization | LakeShore | HMS 7700A |
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| High resolution powder diffraction | Characterization | Bruker | D8-A25 |
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| Image Plate Diffractometer | Characterization | Huber | G670 |
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| Ion implantation | Other processes | NEC | Tandem Accelerator |
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| JEOL 2100F | Surface analysis & TEM | JEOL | 2100F |
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| Laser cutter - ELAS | Sample preparation | ELAS | MASTER Mini PSG-532 |
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| Laser Cutter - Roffin | Sample preparation | Roffin | PL E 25 SHG CL Flex |
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| Low energy electron diffraction (LEED) - Flextura | Characterization | Specs | Flextura |
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| Low resolution transmission XRD | Characterization | Bruker | D5000 |
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| Magnetron sputter DC/RF - Moorfield | Thin film deposition | Moorfield | MiniLab |
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| Magnetron sputter DC/RF - NanoPVD | Thin film deposition | Moorfield | NanoPVD Model S10A |
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| Magnetron sputter DC/RF - Semicore | Thin film deposition | Semicore | TriAxis |
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| Magnetron sputter DC/RF/HiPIMS - Flextura Gate 2 | Thin film deposition | Polyteknik | Flextura |
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| Magnetron sputter Remote plasma - Flextura Gate 3 | Thin film deposition | Polyteknik | Flextura |
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| Mask aligner 2 | Lithography | Karl Suss | MJB55 |
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| Multi Purpose Powder X-ray Diffraction | Characterization | Bruker AXS | D8-A25 |
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| Optical Microscope | Other processes | Olympus | BX 41 M |
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| Plasma-enhanced chemical vapor deposition (PECVD) | Plasma deposition | Advanced Vacuum | Vision 310 MK II |
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| Probe station | Characterization | Wentworth Laboratories | Pegasus S200FA |
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| Protochips Atmosphere Holder | Characterization | Protochips | Atmosphere |
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| Protochips Fusion Holder | Characterization | Protochips | Fusion |
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| Pulsed laser deposition - Combinatorial chamber | Thin film deposition | Twente Solid State Technology | NA |
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| Pulsed laser deposition - Epitaxial chamber | Thin film deposition | Twente Solid State Technology | NA |
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| QSSPC | Characterization | Sinton Instruments | WCT-120 + Suns-Voc |
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| Rapid Thermal Processing (RTP) - Micro | Thermal processes | AnnealSys | AS-Micro |
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| Rapid Thermal Processing (RTP) - One | Thermal processes | AnnealSys | AS-One |
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| Reactive Ion Etch (RIE) | Dry etching | Advanced Vacuum | Vision 320 MK II |
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| Resist spinner | Lithography | - | CEE 100 |
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| Routine Powder Diffraction | Characterization | Bruker AXS | D8 Discover |
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| Rutherford backscattering spectrometry (RBS) | Characterization | Custom made | - |
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| Scanning Probe Microscope | Surface analysis & TEM | Nanonics | MV2000 |
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| SEM & EDS IT-300 | Characterization | JEOL | IT-300 |
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| Single crystal X-ray diffraction (dual source) | Characterization | Bruker | D8-Venture |
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| Small Angle Scattering | Characterization | Bruker | Nanostar |
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| Solar simulator | Characterization | Newport | 91160 Full Spectrum Solar Simulator |
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| Spectrophotometer | Characterization | Shimadzu | SolidSpe-3700 DUV |
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| Steady-state photo capacitance | Characterization | Custom made | NA |
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| Stylus profiler - Clean room | Characterization | Bruker | DektakXT-A |
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| Stylus profilometer - SIMS room | Characterization | Veeco | Dektak 8 |
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| Tabletop Maskless Litography/Aligner System | Lithography | Heidelberg instruments | uPG501 |
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| Temperature Dependent Scanning Probe Microscope | Surface analysis & TEM | Nanonics | MV2000 |
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| Thermal evaporator | Thin film deposition | Balzers | BAE 250 |
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| Thin Film XRD | Characterization | Panalytical | Empyrean |
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| Transmission powder XRD | Characterization | Bruker | D5000 |
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| Tube 1 - 4-stack furnace | Thermal processes | ThermCo | ThermCo |
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| Tube 2 - 4-stack furnace | Thermal processes | ThermCo | ThermCo |
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| Tube 3 - 4-stack furnace | Thermal processes | ThermCo | ThermCo |
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| Tube 4 - 4-stack furnace | Thermal processes | ThermCo | ThermCo |
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| Tube furnace - Big blue | Thermal processes | Gero | 75242 |
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| Tube furnace - Birkeland | Thermal processes | GSL1100X | GSL1100X |
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| Tube furnace - Lindberg | Thermal processes | Lindberg | 59544 |
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| Tube furnace - Small blue | Thermal processes | Gero | - |
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| Warm cabinet | Thermal processes | - | - |
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| Wet bench - Acids | Wet process benches | - | - |
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| Wet bench - Lithography | Wet process benches | - | - |
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| Wet bench - RCA | Wet process benches | - | - |
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| Wet bench - Solvents | Wet process benches | - | - |
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| X-ray Diffraction - Rigaku SmartLab | Characterization | Rigaku | Smartlab |
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| X-ray photoemission spectroscopy (XPS) - Flextura | Characterization | Specs | XR-50 Twin anode |