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View
| Room-temperature Hall (MEMS room) | Characterization | LakeShore | HMS 7700A |
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View
| 22:053 Big preplab | Other processes | - | - |
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View
| 22:064 AFM, Tabletop SEM | Other processes | - | - |
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View
| 22:125 Ion mills | Other processes | - | - |
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View
| 22:126 Tabletop XRD | Other processes | - | - |
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View
| 22:129 Glovebox, mill, burner | Other processes | - | - |
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View
| 22:132 | Characterization | FP | Fp |
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View
| 22:133 | Characterization | FP | FP |
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View
| 22:134 Ole Bjørn's office | Other processes | - | - |
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View
| 22:135 Phuong's office | Other processes | - | - |
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View
| 22:136 | Characterization | FP | FP |
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View
| 22:137 | Characterization | FP | Fp |
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View
| 22:138 | Characterization | FP | Fp |
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View
| 22:139 | Characterization | FP | FP |
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View
| 22:140 | Characterization | FP | FP |
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View
| 22:142 | Characterization | FP | Fp |
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View
| 22:161 Big grinding room | Other processes | - | - |
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View
| 22:162 Multiprep | Other processes | - | - |
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View
| 32:024-A | Characterization | FP | FP |
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View
| 32:024-B | Characterization | FP | FP |
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View
| 32:024-C | Characterization | FP | Fp |
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View
| 32:062-A | Characterization | FP | Fp |
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View
| 32:062-B | Characterization | FP | FP |
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View
| 32:102 | Characterization | FP | Fp |
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View
| 32:105 | Characterization | FP | FP |
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View
| 32:106 | Characterization | FP | Fp |
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View
| 32:107 | Characterization | FP | Fp |
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View
| 32:108 | Characterization | FP | Fp |
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View
| 32:109 | Characterization | FP | Fp |
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View
| 32:112 | Characterization | FP | FP |
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View
| 32:151-A | Characterization | FP | Fp |
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View
| 32:151-B | Characterization | FP | Fp |
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View
| 3D Printer | Other processes | Prusa | I3 MK3S |
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View
| 3-zone furnace | Thermal processes | Thermo scientific | Lindberg Blue M |
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View
| 4-point probe | Characterization | Jandel | KM3-AR |
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View
| Acid Wet bench | Wet process benches | - | - |
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View
| Anechoic chamber | Other processes | Unknown | 2011 |
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View
| Angstrom - E-beam and thermal PVD | Thin film deposition | Ångstrom Engineering | EvoVac |
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View
| Atomic layer deposition (ALD) | Plasma deposition | Beneq | TFS 200- 148 |
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View
| Big blue tube furnace | Thermal processes | Gero | 75242 |
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View
| Birkeland Tube furnace | Thermal processes | GSL1100X | GSL1100X |
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View
| Cross Section Polisher | Other processes | Jeol | IB-19520CCP |
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View
| DLTS setup “Asterix“ | Characterization | UiO | NA |
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View
| DLTS setup “Idefix“ | Characterization | UiO | NA |
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View
| DLTS setup “Obelix“ | Characterization | UiO | NA |
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View
| DLTS setup “Tiffy“ | Characterization | UiO | NA |
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View
| Ellipsometer | Characterization | Woolam | AlphaSE |
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View
| Farraday Cage | Other processes | Unknown | 2010 |
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View
| FEI Titan 60-300 | Surface analysis & TEM | FEI Company | Titan G2 60-300 |
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View
| Flextura - Angular-resolved UV photoemission spectroscopy (UPS) / (ARPES) | Surface analysis & TEM | Specs | Flextura |
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View
| Flextura - Annealing chamber | Thermal processes | Polyteknik | Flextura |
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View
| Flextura - Low energy electron diffraction (LEED) | Surface analysis & TEM | Specs | Flextura |
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View
| Flextura - Magnetron sputtering chamber | Thin film deposition | Polyteknik | Flextura |
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View
| Flextura - Remote plasma chamber | Thin film deposition | Polyteknik | Flextura |
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View
| Flextura - X-ray photoemission spectroscopy (XPS) | Surface analysis & TEM | Specs | XR-50 Twin anode |
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View
| Forming gas | Sample preparation | AGA | H2/N2 |
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View
| FT-IR | Characterization | Bruker | IFS 125HR |
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View
| High resolution powder diffraction | Characterization | Bruker | D8-A25 |
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View
| Image Plate Diffractometer | Characterization | Huber | G670 |
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View
| Ion implanter | Other processes | NEC | Tandem Accelerator |
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View
| IT-300 SEM | Characterization | JEOL | IT-300 |
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View
| JEOL 2100F | Surface analysis & TEM | JEOL | 2100F |
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View
| Lagerrom-Fysikkbygget | Other processes | UiO | UiO |
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View
| Laser Cutter | Other processes | Roffin | PL E 25 SHG CL Flex |
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View
| Leybold E-beam evaporation | Thin film deposition | Leybold | L 560 K |
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View
| Lindberg Tube furnace | Thermal processes | Lindberg | 59544 |
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View
| Lithography Wet bench | Wet process benches | - | - |
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View
| Low resolution transmission XRD | Characterization | Bruker | D5000 |
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View
| Low temperature powder XRD | Characterization | Bruker | D5000 |
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View
| Low-temperature Hall (Cleanroom) | Characterization | LakeShore | EM4 HGA |
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View
| Mask aligner 2 | Lithography | Karl Suss | MJB55 |
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View
| Moorfield - DC/RF Magnetron sputter | Thin film deposition | Moorefield | MiniLab |
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View
| MOVPE / MOCVD | Epitaxy | EMF | Titan Reactor |
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View
| Multi Purpose Powder X-ray Diffraction | Characterization | Bruker AXS | D8-A25 |
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View
| NanoPVD - DC/RF Magnetron sputter | Thin film deposition | Moorfield | NanoPVD Model S10A |
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View
| Network analyzer ZVA67 | Network Analyzer | Rohde & Schwarz | 2013 |
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View
| Optical Microscope | Other processes | Olympus | BX 41 M |
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View
| PCB-milling machine | Other processes | LPKF | 2012 |
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View
| PECVD | Plasma deposition | Advanced Vacuum | Vision 310 MK II |
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View
| Probe station | Characterization | Wentworth Laboratories | Pegasus S200FA |
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View
| Probestation with laser cutter | Other processes | Signatone | 2012 |
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View
| QSSPC | Characterization | Sinton Instruments | WCT-120 + Suns-Voc |
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View
| Rapid Thermal Processing - Micro | Thermal processes | AnnealSys | AS-Micro |
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View
| Rapid Thermal Processing - One | Thermal processes | AnnealSys | AS-One |
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View
| RBS | Characterization | Custom made | - |
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View
| RCA Wet bench | Wet process benches | - | - |
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View
| Reactive Ion Etch | Dry etching | Advanced Vacuum | Vision 320 MK II |
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View
| Resist spinner | Lithography | - | CEE 100 |
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View
| Room-temperature Hall (Cleanroom) | Characterization | Lake Shore | EM4 HGA |
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View
| Routine Powder Diffraction | Characterization | Bruker AXS | D8 Discover |
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View
| Scanning Probe Microscope | Surface analysis & TEM | Nanonics | MV2000 |
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View
| Semicore - DC/RF Magnetron sputter | Thin film deposition | Semicore | TriAxis |
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View
| Single crystal X-ray diffraction (dual source) | Characterization | Bruker | D8-Venture |
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View
| Small Angle Scattering | Characterization | Bruker | Nanostar |
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View
| Small blue tube furnace | Thermal processes | Gero | - |
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View
| Solar simulator | Characterization | Newport | 91160 Full Spectrum Solar Simulator |
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View
| Solvent Wet bench | Wet process benches | - | - |
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View
| Spectrophotometer | Characterization | Shimadzu | SolidSpe-3700 DUV |
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View
| Steady-state photo capacitance | Characterization | Custom made | NA |
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View
| Stylus profiler | Characterization | Bruker | DektakXT-A |
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View
| Stylus profilometer | Characterization | Veeco | Dektak 8 |
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View
| Tabletop Maskless Litography/Aligner System | Lithography | Heidelberg instruments | uPG501 |
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View
| Temperature Dependent Scanning Probe Microscope | Surface analysis & TEM | Nanonics | MV2000 |
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View
| Thermal evaporator | Thin film deposition | Balzers | BAE 250 |
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View
| Thin Film XRD | Characterization | Panalytical | Empyrean |
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View
| Transmission powder XRD | Characterization | Bruker | D5000 |
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View
| Tube 1 - 4-stack furnace | Thermal processes | ThermCo | ThermCo |
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View
| Tube 2 - 4-stack furnace | Thermal processes | ThermCo | ThermCo |
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View
| Tube 3 - 4-stack furnace | Thermal processes | ThermCo | ThermCo |
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View
| Tube 4 - 4-stack furnace | Thermal processes | ThermCo | ThermCo |
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View
| Variable-temperature Hall (MEMS room) | Characterization | LakeShore | HMS 7700A |
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View
| Warm cabinet | Thermal processes | - | - |
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View
| WaveMaster 830Zi Oscilloscope | Other processes | LeCroy | 2010 |
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View
| Wirebonder | Device mounting | Signatone | 2011 |
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View
| XRD | Characterization | Bruker | AXS D8 Discover |