Picture of Resist spinner
Current status:
AVAILABLE
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1st Responsible:
2nd Responsible:
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Material Class:

 

Technology Description:

 

Spin Coating is the standard method for applying photoresist coating to produce a thin uniform layer of photoresist on the wafer surface.

Technical Information:

Type: CEE 100

 

Tool name:
Resist spinner
Area/room:
Lithography-room
Category:
Lithography
Manufacturer:
-
Model:
CEE 100
Tool rate:
C
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

Instructors

Licensed Users

Photolithography
Photolithography 2
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