Picture of Resist spinner
Current status:
AVAILABLE
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Responsibles
1st Responsible:
Viktor Bobal
2nd Responsible:
Files
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Description

Material Class:

  

Technology Description:

 

 Spin Coating is the standard method for applying photoresist coating to produce a thin uniform layer of photoresist on the wafer surface.

Technical Information:

 Type: CEE 100

 

Details
Tool name:
Resist spinner
Area/room:
MiNaLab Lithography-room
Category:
Lithography
Manufacturer:
-
Model:
CEE 100
Tool rate:
C
Instructors & Licensed Users

Instructors

Licensed Users

Process Lines
Photolithography
Photolithography 2
Tool Modes
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