Deposition chamber accommodating samples up to 200 mm in diameter and 5 mm in height (2D chamber).
Large 3D chamber available, for 3D samples up to 200 mm in diameter and 100 mm in height.
Ozone generator in the instrument.
N2-generator providing >5N N2 directly connected to the ALD.
Thermal ALD deposition.
Plasma-enhanced ALD deposition.
Deposition temperature range: RT – 500 ºC.
Two hot sources available; can be heated to 300 ºC and 500 ºC.
Four RT sources evaporated from own vapor pressure.
QCM (Quartz Crystal Microbalance) available to investigate sub-cycle parameters.
Typical deposition rates at 200 ºC ~1nm/min, with 15 minutes added to each deposition for pumping and venting.
Materials: Al2O3, TiO2, ZnO, ZnO:Al.