Picture of Leybold E-beam evaporation
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Material Class:

Vacuumcompatible solids

Technology Description:

 

Thin film deposition or metallization of surfaces by evaporation of a target using an electron beam. The e-beam evaporator at UiO MiNaLab can sequentially deposit up to 4 materials during one cycle without breaking vacuum.

The maximum allowed thickness is 400 nm. For thicker films consider, sputtering or electroplating.

Technical Information:

Type: Leybold

DC V 6-12 kV

Beam power: 5 kW at 12 kV

Metals: Al, Ag, Au, Pt, Pd, Si, Ti, Ni

Al, Si and Ni are included in the hourly price, for other metals please contact tool responsible for details.

Ultimate vacuum: < 1 x 10-6 mbar

 

Tool name:
Leybold E-beam evaporation
Area/room:
Clean Room
Category:
Thin film deposition
Manufacturer:
Leybold
Model:
L 560 K
Tool rate:
C
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

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