Sources: 1 DC
Target size: 1 x 2”
Substrate size: 4” Single wafer chamber, but smaller samples can be mounted on the sample holder.
Substrate heating: 20 ºC - 1000 ºC
Gas: Ar, N2, O2 and H2
Materials: All materials that are grown in the Flextura system, or is introduced for surface-sensitive analysis in Gate 5 (Analysis chamber) are allowed in this chamber.