Picture of Reactive Ion Etch
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AVAILABLE
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Material Class:

 

Technology Description:

 

The reactive ion etch (RIE) is an isotropic and directional dry etching for SiO2, Si3N4, Si, polymers, metals (limited performance) and surface plasma treatment.

Technical Information:

Type: Advanced Vacuum Vision 320 MK IISize: Up to 12″ wafer size

 

Tool name:
Reactive Ion Etch
Area/room:
Clean Room
Category:
Dry etching
Manufacturer:
Advanced Vacuum
Model:
Vision 320 MK II
Tool rate:
C
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

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