Picture of Rapid Thermal Processing (RTP) - One
Current status:
AVAILABLE
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Responsibles
1st Responsible:
Viktor Bobal
2nd Responsible:
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Description

Material Class:

 Si

Technology Description:

 

 Annealsys Rapid Thermal Annealing furnaces use infrared lamp heating and can be used for various applications for silicon, compound semiconductor, photovoltaic, MEMS and other materials. Typical processes include implantation annealing, contact annealing, crystallization and densification. Rapid thermal oxidation and nitridation are also commonly performed.

Technical Information:

 Ramp rate 50deg/s
  • 4” Single wafer chamber for Si

 

Details
Tool name:
Rapid Thermal Processing (RTP) - One
Area/room:
MiNaLab Clean Room
Category:
Thermal processes
Manufacturer:
AnnealSys
Model:
AS-One
Tool rate:
C
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Instructors

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Tool Modes
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