Picture of Rapid Thermal Processing - One
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AVAILABLE
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Material Class:

Si

Technology Description:

 

Annealsys Rapid Thermal Annealing furnaces use infrared lamp heating and can be used for various applications for silicon, compound semiconductor, photovoltaic, MEMS and other materials. Typical processes include implantation annealing, contact annealing, crystallization and densification. Rapid thermal oxidation and nitridation are also commonly performed.

Technical Information:

Ramp rate 50deg/s
  • 4” Single wafer chamber for Si

 

Tool name:
Rapid Thermal Processing - One
Area/room:
Clean Room
Category:
Thermal processes
Manufacturer:
AnnealSys
Model:
AS-One
Tool rate:
C
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

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