Sources: 2 DC, 2 RF and 1 HiPIMS (High-power Impulse Magnetron Sputtering)
Target size: 5 x 3”
Substrate size: 4” Single wafer chamber, but smaller samples can be mounted on the sample holder.
Substrate heating: 20 ºC - 1000 ºC
Gas: Ar, N2, O2 and H2
Materials: Selected nitride and oxynitride systems.