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Material Class: ZnO, ZnCdO, ZnMgO
Technology Description:

 

MOCVD (Metal-Organic Chemical Vapor Deposition) is a chemical vapor deposition method of epitaxial growth of materials, especially compound semiconductors from the surface reaction of organic compounds or metalorganics and metal hydrides containing the required chemical elements. The MOCVD at UiO MiNaLab is dedicated toZnO, ZnCdO, ZnMgO and related material systems.
Technical Information:  Titan (EMF) reactor

 

Tool name:
MOVPE / MOCVD
Area/room:
Clean Room
Category:
Epitaxy
Manufacturer:
EMF
Model:
Titan Reactor
Tool rate:
E
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

Instructors

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