Picture of Mask aligner 2
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Material Class:

 

Technology Description:

 

Maskaligners are used in photolithography to transfer a pattern on a photomask to a photoresist on a wafer. This photoresist can then serve as e.g. an etch mask to transfer the pattern into the wafer. The photoresist can also be removed after metal deposition, leaving a metal pattern on the wafer (lift-off).Soft and hard contact exposures give a resolution of 1-2 µm. Vacuum contact exposure give higher resolution (0,6 µm) but shortens the mask lifetime, whereas proximity exposures give lower resolution but less wear on the mask

Technical Information:

Type: Karl Suss MJB55

350 W mercury short-arc lam

 

Tool name:
Mask aligner 2
Area/room:
Lithography-room
Category:
Lithography
Manufacturer:
Karl Suss
Model:
MJB55
Tool rate:
C
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

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Photolithography 2
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